INSTRUMENT INTRODUCTION

Model No.: MA605080104

Manufacturer: Munich

Main specifications and technical parameters:

Lamp power: 350W Wavelength: Maximum size of mask plate: 7 inch, corresponding to substrate one inch smaller (6 inch), Exposure type: proximity Exposure accuracy equal to or better than 2.5 μm; soft-contact exposure 2 μm; hard-contact exposure 1 μm; Registration accuracy of alignment marks (crosses) is ± 0.5 μm typical.

Main functions and features:

Function: After aligning the substrate and the mask plate, the substrate coated with UV photoresist on the surface is exposed, and the graphic on the mask plate is formed on the photoresist of the substrate after development; proximity, soft-contact, and hard-contact exposure modes can be used; exposure can be performed on positive or negative photoresists, and the minimum size of the exposed graphic can be up to 1 μm Micrometer application: used for the preparation of micrometer-sized electronic devices, MEMS systems, biological medical chips, etc.

Placement:

Optoelectronics Center, Shenzhen University, South Campus of SZU, the first phase of the Basic Experiment Building, negative 1 floor