INSTRUMENT INTRODUCTION

Model No.: Q23504400618

Manufacturer: Alpha Plasma

Main specifications and technical parameters:

1. Chamber material and size: quartz, 12 liters, 240mm diameter, 260mm depth 2. Sample size processed: up to one 8" sample 3. Vacuum pump: BOC Edwards XDS35i dry pump, pumping speed 35 m3/h 4. Process gases: two ways: oxygen, argon, MKS mass flow controller to control gas flow, flow control upper limit of 500 and 200 sccm; gas input chamber with homogeneous design to ensure the uniformity of the plasma 5. microwave source: power 100-600W, 2.45GHz, auto-coupling 6. Software fully automated control: 10.4" display, touch-screen operation; The Windows® based touch screen interface provides fully automated control with a graphical user interface designed to be easy to use and learn; USB interface, convenient data retrieval; remote control, compatible with window office User password protection settings Process data can be stored, process parameters can be output Real-time monitoring of the process and data in the form of charting Automatic or manual operation can be realized. 7. the equipment requires a small footprint, not more than: 620x500x550mm (WxHxD)

Main functions and features:

In the pre-process of micro-nanofabrication, the photoresist is just the medium of graphic transformation, when the micro-nanograms are formed on the photoresist after photolithography, it is necessary to carry out the next step of the process of growth or etching, and after that it is necessary to remove the photoresist by some method. Microwave plasma debonder can realize this function. It generates a plasma by microwave and at the same time passes in oxygen, which reacts with the photoresist in an oxidizing reaction, forming a gas that is pumped away by a mechanical pump.

Placement:

Optoelectronics Center, Shenzhen University, South Campus of SZU, the first phase of the Basic Experiment Building, negative 1 floor