High-Resolution Electron Beam Imaging Exposure Machine

INSTRUMENT INTRODUCTION

Brand: Raith

Model: PIONEER Two

Manufacturer: Raith GmbH

Origin: Germany

Main specifications and technical parameters:

Schottky thermal field emission electron gun Electron beam energy: 20eV~30keV; Minimum spot size ≤1.6nm; Minimum line width ≤8nm; Stroke of table movement: 50 x 50 x 25 mm; Laser interference table positioning accuracy: 1nm; Suitable for samples 2 inches and below; Splicing/nesting accuracy ≤60nm [mean + 3σ]; Bruker QUANTAX 200 Energy Spectrometer

Main functions and features:

It is mainly used for the processing of micro and nano optoelectronic devices, secondary electron imaging measurements, and compositional analysis of materials. The main functions of the equipment are high-resolution electron beam exposure, high-resolution electron beam imaging measurement, and energy spectrum analysis

Placement:

Optoelectronics Center, Shenzhen University, South Campus of SZU, the first phase of the Basic Experiment Building, negative 1 floor