INSTRUMENT INTRODUCTION

Brand: Syskey

Model No.: ASN-EPI-C6

Manufacturer: AOpen Technology Inc.

Origin: Taiwan, China

Main Functions and Features:

The equipment consists of ultra-high vacuum electron beam evaporation process chamber, chemical vapor deposition process chamber, plasma etching process chamber, central transfer chamber, rapid sample feeding and sample turning chamber and control cabinet. The center is capable of depositing a variety of thin film materials, including metals, semiconductors, and various dielectric materials, as well as etching dielectric materials, and supports a maximum sample size of 6 inches. Currently the center supports the following ten plating materials: Au, Pd, Pt, Ag, Cu, Ti, Cr.

Placement Location:

Optoelectronics Center, Shenzhen University, South Campus of SZU, the first phase of the Basic Experiment Building, negative 1 floor