Manufacturer: UAB Altechna R&D

Place of origin: Lithuania

Main specifications and technical parameters:

Femtosecond laser source: 1. wavelength: 1028±5 nm 2. average power: ≥4W @ 1028 nm 3. repetition frequency: adjustable from 1 Hz to 200 kHz 4. pulse width: adjustable from 290 fs to 10 ps 5. max. pulse energy: >200 μJ 6. beam diameter: 3 ±1 mm 7. closed water cooling Dual-expansion module: 1. output wavelength: 514±3 nm 2. conversion efficiency: >50 % @514±3 nm 2. Conversion efficiency: >50 % @514 nm Precision positioning stage: 1. XYZ1+Z2 four-axis positioning stage (X-axis and Y-axis are air-bearing stages) 2. Stroke (XYZ1Z2): 200*100*5*50 mm 3. Positioning accuracy XY: ±400 nm 4. Positioning accuracy Z1: ±1.5 μm 5. Positioning accuracy Z2: ±2.5 μm 6. Repeatability XY: ±100 μm 6. Repeatability XY: ±100 nm 7. Resolution XY: 5 nm Spatial Light Modulator (SLM) 1. Matrix size: SXGA (1280 x 1024 pixels) 2. Operating wavelength: 510 ± 50 nm 3. Input bits: 256 (8 bits) levels 4. Effective area: 16 mm x 12.8 mm 5. Spatial resolution: ≤25 lp/mm 6. Optical conversion: ≤1000 lp/mm 6. Optical conversion: ≤2.5 nm lp/mm 6. Optical conversion efficiency: ≥98 % Focusing optics 1. Magnification/numerical aperture: 10x, 20x, 50x, 100x, 63x, of which 63x is an oil lens. 2. 2. Numerical aperture corresponds to: 0.28, 0.29, 0.42, 0.7, 1.4 3. Working distance corresponds to: 34, 31, 17, 6, 0.1 4. Resolution corresponds to: 4 μm, 2 μm, 1 μm, 0.5 μm, 0.3 μm

Main functions and features:

1. Microfabrication: micro-cutting, drilling, slotting, marking, etc. 2. Fabrication of surface micro-nano-structures 3. Fabrication of optical waveguides 4. Dual/multiple photon polymerization

Placement:

Optoelectronics Center, Shenzhen University, South Campus of SZU, the first phase of the Basic Experiment Building, negative 1 floor