INSTRUMENT INTRODUCTION

Model: Nanoscribe Photonic Professional GT

Manufacturer: Nanoscribe, Germany

Origin: Lithuania

Main specifications and technical parameters:

Hardware Technical Parameters: 1) Wide selection of photosensitive materials, including SU-8, Ormocere, PEG-DA, AZ series, As2S3, IP-L 780, IP-G 780, etc.; 2) Minimum machinable range of 100 x 100 mm² for 2D planar surfaces; 3) Repeatability of writing operations with a repeatability error of <± 10 nm for 3D moving tables; 4) Minimum horizontal 3D linewidth <200 nm; 5) Minimum horizontal 2D linewidth <160 nm; 6) Optimum resolution of 3D structures in the vertical direction, with a minimum grid size of less than 1000 nm; 7) Optimum resolution of 2D structures in the horizontal direction, with a maximum resolution of less than 500 nm; 8) Maximum writing speed in scanning galvanometer mode of more than 10 mm/sec; *9) Real-time monitoring and control of the laser writing process; 10) Maximum writing speed of more than 10 mm/sec. in scanning galvanometer mode; *10) Maximum writing speed of more than 10 mm/sec. in laser writing mode. Real-time monitoring of the laser writing process; 10) Laser pulse width of 120 fs, frequency of 80MHz ± 1MHz.

Software Capabilities: a) For the workpiece stage that can load multiple samples at the same time, the device must have the ability to automatically switch from one sample position to another; b) Automatically switch between different microscope lenses; *c) The device must have the ability to automatically detect the interface between the photoresist and the substrate. If the difference in refractive index between the photoresist and substrate interface is large (e.g., IP-L 780 and glass substrate), the interface can be found with an accuracy of ±150 nm under the condition of using a high numerical aperture objective lens; d) the ability to automatically detect the tilt of the substrate and accordingly compensate for the coordinate transformation to maintain the designed device is not distorted; e) the equipment needs to have a secondary calibration function. If the workpiece needs to go through two different processing steps, then the equipment needs to be able to accurately adjust the position of the second step of sample processing based on the first step of processing; f) The equipment must be able to automatically adjust the speed of movement, especially in the turn, in order to maintain the sample processing speed at the same time to achieve a high degree of fidelity; g) According to the movement of the workpiece table real-time modulation of the laser energy to maintain a constant linewidth; h) The equipment must be able to automatically detect and compensate for the tilt of the substrate to maintain the design of the device without distortion h) Remote control: the calculator has a remote control function so that the system supplier can provide real-time assistance and application support via the Internet; i) Import of 3D models: compatible with the STL graphic file format; j) If the STL file format is used, it is necessary to highly compensate the exposure during the automatic conversion of the STL file into the native executable file of the device, in order to overcome the dispersion of the laser light caused by the chromatic aberration of the laser. to overcome the loss of laser energy due to chromatic dispersion; k) the device is able to overcome the instability of the focused spot along the Z-axis caused by spherical aberration to achieve highly directional uniformity of the workpiece; l) large solid structures can be processed by exposing only the shell layer, which greatly reduces the processing time

Placement:

Optoelectronics Center, Shenzhen University, South Campus of SZU, the first phase of the Basic Experiment Building, negative 1 floor